Extreme Ultraviolet Lithography (EUVL) Equipment Market Size, Share and Growth

Posted by michael on August 12th, 2019

Extreme Ultraviolet Lithography (EUVL) Equipment Market Size and Growth Rate:

As per the latest reports published by Research Cosmos, Extreme Ultraviolet Lithography (EUVL) Equipment Market is poised to touch USD 1.96 billion by 2023 growing at a CAGR of 9.3% by 2022.

Browse details of 140 number of pages research report developed on Extreme Ultraviolet Lithography (EUVL) Equipment Market@ https://www.researchcosmos.com/reports/extreme-ultraviolet-lithography-euvl-equipment-market/53560701

Extreme Ultraviolet Lithography (EUVL) Equipment Market Overview:

Extreme Ultraviolet Lithography (EUVL) Equipment Market is the next-generation lithography technology that uses the smaller wavelengths to create circuits with small features and obtains a better resolution output. Lithography is used to print complex patterns in semiconductor wafers that define integrated circuits. EUV Lithography is one of the latest generations in Lithographic Technologies. Plasma produced by discharge and plasma produced by laser are key technologies used to produce high energy radiation.

Extreme Ultraviolet Lithography (EUVL) Equipment Market Growth Drivers and Restraints:

It is expected that global Extreme Ultraviolet Lithography Equipment Market will be witness considerable growth rates during the forecast period due to an increase in miniaturization and refinement of elements of the electronic circuit. The state-of-the-art EUV lithography systems allow customers to manufacture smaller, faster and more powerful chips that require maximum lithography. In addition, conventional argon fluoride techniques require expensive multi-modeling masks. This technology requires up to four masks to create a layer of silicon wafer, but EUV lithography only requires a mask to create the layer. This factor is expected to expand the market over the next few years.

However, due to the high cost of extreme ultraviolet lithography equipment, the market faces some difficulties. This high cost is due to the advanced, complex and unique features of the equipment, as it uses extremely short wavelengths. It is expected that the increased use of extreme ultraviolet lithography and masking layers in the semiconductor industry compared to argon fluoride immersion techniques will provide significant opportunities in the global market in the near future.

Geographical Analysis of Extreme Ultraviolet Lithography (EUVL) Equipment Market:

Geographically, the world market is segmented as Asia Pacific, Middle East and Africa, South America, North America, Europe and Asia. With regard to income, the Asia Pacific region occupies the first place in the global market. The market in this region is expected to grow at an average annual growth rate of 28.6% in the forecast period. With the arrival of a large number of semiconductor companies in the Asia-Pacific region, extreme ultraviolet lithography has been adopted.

With the high use of semiconductor devices such as memories in the Asia-Pacific region, Korea accounts for a large part of the profit margin of the ultra-violet lithography market followed by Taiwan. In addition, it is expected that the growth of the semiconductor industry in the Japanese market will greatly increase the CAGR during the forecast period.

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Key Players of Extreme Ultraviolet Lithography (EUVL) Equipment Market:

The main companies in the global Extreme Ultraviolet Lithography (EUVL) Equipment Market include Intel Corporation, ASML Holding, Samsung Electronics, Canon, Nikon, Taiwan Semiconductor Manufacturing Company Limited (TSMC) and Carl Zeiss AG.

Extreme Ultraviolet Lithography (EUVL) Equipment Market Segmentation:

By Light Source:

  • Laser Produced Plasmas (LPP)
  • Vacuum Sparks
  • Gas Discharges

By Equipment:

  • Light Source
  • Mirrors
  • Mask

By Application:

  • Memory
  • IDM
  • Foundry

By Region:

  • North America
  • South America
  • Europe
  • Asia Pacific
  • Middle East and Africa

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Kevin Stewart

Global Sales Manager

Research Cosmos

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Joined: April 4th, 2019
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